Specifications:

• Make/model: HHV

• Vacuum Level: High vacuum (10⁻⁶mbar).

• Substrate Sizes: Up to 6 inches in diameter.

• Temperature Control: Substrate heating up to500°C.

• Cooling: Water–cooled chamber and components

• Temperature: Over 3500°C(Thermal evaporation)

Our potential actions

• Deposition of transparent conductive oxides (e.g., ZnO).
• Study of optical coatings for antireflection or high-reflectivity purposes
• Develop thin films for gas sensing applications.
• Deposition of thin films for supercapacitors (e.g.,MnO2,NiO).
• Study of catalytic thin films for hydrogen evolution reaction (HER).
• Develop wear-resistant or corrosion-resistant coatings
• DeterminationofcorrosionbehaviourofmaterialsthroughElectrochemical Workstation Work done
• Utilization of the arc melt growth method for high-purity alloy fabrication.
• Synthesis of advanced high-entropy alloys(HEAs) and Heusler alloys.
• Development of materials with exceptional mechanical, magnetic, and catalytic properties.
• Focus on thermoelectric and spintronic applications.